Short course on Atomic Layer Deposition
Date: April 20, 2017
Registration is open until April 10 and is on a first come, first served basis. Registration includes participation in the ALD short course, a digital copy of the course notes, coffee/tea and lunch.
The registration fee depends on whether participants are from academia or industry:
For participants from academia, the registration fee is €200 per person. For students (including PhD students), the registration fee is €100 per student.
For participants from industry, the registration is €500 for the 1st person from a company, €350 for the 2nd person, and €200 for the 3rd person. If more than 3 persons from one company participate, the fee is €200 for every additional participant.
Registration is a two-step process:
Fill in the online form below. You will receive an automated e-mail acknowledging your interest in the ALD short course.
Transfer the registration fee (free of possible bank charges) to the following bank account while providing the information:
- name(s) of the participant(s)
Bank account information:
Account owner: Stichting tot Bevordering van de Plasmachemie
City: Tilburg, The Netherlands
Registration is only complete when both steps have been taken. At that stage, the successful registration will be confirmed.